Source: Physical Chemistry Chemical Physics - PCCP. Unidade: FFCLRP
Subjects: ÓXIDO NÍTRICO, RUTÊNIO, QUÍMICA QUÂNTICA, FOTOQUÍMICA
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BATISTA, Ana P. de Lima e OLIVEIRA FILHO, Antonio Gustavo Sampaio de e GALEMBECK, Sérgio Emanuel. Photophysical properties and the NO photorelease mechanism of a ruthenium nitrosyl model complex investigated using the CASSCF-in-DFT embedding approach. Physical Chemistry Chemical Physics - PCCP, v. 19, n. 21, p. 13860-13867, 2017Tradução . . Disponível em: https://doi.org/10.1039/c7cp01642e. Acesso em: 27 abr. 2024.APA
Batista, A. P. de L., Oliveira Filho, A. G. S. de, & Galembeck, S. E. (2017). Photophysical properties and the NO photorelease mechanism of a ruthenium nitrosyl model complex investigated using the CASSCF-in-DFT embedding approach. Physical Chemistry Chemical Physics - PCCP, 19( 21), 13860-13867. doi:10.1039/c7cp01642eNLM
Batista AP de L, Oliveira Filho AGS de, Galembeck SE. Photophysical properties and the NO photorelease mechanism of a ruthenium nitrosyl model complex investigated using the CASSCF-in-DFT embedding approach [Internet]. Physical Chemistry Chemical Physics - PCCP. 2017 ; 19( 21): 13860-13867.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1039/c7cp01642eVancouver
Batista AP de L, Oliveira Filho AGS de, Galembeck SE. Photophysical properties and the NO photorelease mechanism of a ruthenium nitrosyl model complex investigated using the CASSCF-in-DFT embedding approach [Internet]. Physical Chemistry Chemical Physics - PCCP. 2017 ; 19( 21): 13860-13867.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1039/c7cp01642e
